Adhesion Improvement and Characterization of Magnetron Sputter Deposited Bilayer Molybdenum Thin Films for Rear Contact Application in CIGS Solar Cells

Table 1

Properties of 900 nm thick single-layer Mo films deposited at HP (6 × 10⁻³ mbar) and LP (1.5 × 10⁻³ mbar), as well as 900 nm thick bilayer Mo films consisting of different thickness ratios of the HP deposited bottom layer and the LP deposited top layer.

	⁢Single-layer Mo films		⁢Bilayer Mo stacks
Sample number	HP	LP	(a)	(b)	(c)	(d)	(e)
Thickness of LP layer (nm)	900	0	810	720	630	540	450
Thickness of HP layer (nm)	0	900	90	180	270	360	450
Sheet resistance (ohm/sq)	0.84	0.31	0.31	0.32	0.32	0.36	0.37
Tape test (fail/pass)