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International Journal of Photoenergy
Volume 2016, Article ID 8183673, 8 pages
http://dx.doi.org/10.1155/2016/8183673
Research Article

Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chemical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Application

1D&S Inc., Tokyo 193-0834, Japan
2AMAYA Co., Ltd., Saitama 343-0822, Japan

Received 9 April 2016; Accepted 7 June 2016

Academic Editor: Prakash Basnyat

Copyright © 2016 Ikuo Kurachi and Kentaro Yoshioka. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Ikuo Kurachi and Kentaro Yoshioka, “Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chemical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Application,” International Journal of Photoenergy, vol. 2016, Article ID 8183673, 8 pages, 2016. https://doi.org/10.1155/2016/8183673.