Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chemical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Application

<div>A schematic of newly developed AP-CVD system. Deposited wafers are carried by SiC trays underneath the multideposition gas dispersion heads (DH1–3). The wafers are also heated by resistive heater coils and lamp heaters at the predeposition zone.</div>

International Journal of Photoenergy

fig1

Figure 1

Figure 1: Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chemical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Application 

Figure 1 | Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chemical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Application 