Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chemical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Application

Figure 4

Boron profiles for the sample with DHF preclean (blue line), HCl/H₂O₂ preclean (red line), and CVD USG 5 nm on the silicon surface (green line). In the case of HF preclean, there must be no oxide between BSG and silicon. In the case of HCl/H₂O₂ preclean, around 1-2 nm chemical oxide exists between BSG and silicon. Even though the chemical or 5 nm CVD oxide exists, the profiles are identical to no oxide case.