Nanostructured Dielectric Layer for Ultrathin Crystalline Silicon Solar Cells

Figure 6

Schematics of the fabrication process of ultrathin c-Si solar cells with NDL on top. (a) Deposit a c-Si solar cell with ultrathin absorber on a semi-insulating substrate using RPCVD; (b) deposit the SiN_x layer and thin SiO_x layer on c-Si solar cell; (c) assemble a monolayer of silica nanospheres on top; (d) dry etch the SiN_x layer to form the NDL; (e) use lithography and wet etching of SiN_x in 6 : 1 BOE to define the top contact region; and (f) create front and back metal contacts.