Silicon Powder-Based Wafers for Low-Cost Photovoltaics: Laser Treatments and Nanowire Etching

Figure 3

(a) SEM image (sample is 70° tilted) of the laser-crystallized thin e-beam-deposited Si layer at the cross section; (b) the corresponding higher magnification SEM image; (c) the boundary at the region deposited with 10 μm a-Si (left side) and that without a-Si (right side) after laser crystallization, the dashed line indicated the boundary between the additional layer and the pc-wafer; (d) EBSD image of the laser-crystallized thin e-beam-deposited Si layer on top of the pc-Si wafer.

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