Research Article
H2O/O2 Vapor Annealing Effect on Spin Coating Alumina Thin Films for Passivation of Silicon Solar Cells
Figure 3
XPS Si 2p core level spectra with suboxides of Al-acac-based AlOx films formed in ambient (a) H2O/O2 for 15 min, (b) H2O/O2 for 120 min, (c) O2 for 15 min, (d) O2 for 120 min, (e) air for 15 min, and (f) air for 120 min.
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| (b) |
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