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Cathode | Anode | Polysulfide solution | Jsc (mA.cm-2) | Voc (V) | Fill factor | ηmax (%) | Reference |
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FTO/PbS (Cyclic Voltammetry) | TiO2/CdS/CdSe | 0.5 M sulfur, 2.0 M Na2S, and 0.2 M KCl in the solution of MeOH/H2O (3/7, v/v) | 10.3 | 0.50 | 0.45 | 2.31 | Le, V. N. [15] |
PbS (Dipping) | FTO/TiO2/CdS/CdSe | 0.1 M sulfur, 1 M Na2S, and 0.1 M NaOH in H2O | 9.28 | 0.554 | 0.588 | 3.01 | Tachan, Z. [14] |
FTO/TiO2/ZnS/Cu2S (Solvothermal) | TiO2/CdS/CdSe | 0.1 M sulfur, 1 M Na2S, and 0.1 M NaOH in H2O | 7.13 | 0.51 | 0.48 | 1.83 | Giménez, S. [24] |
RGO-Cu2S (spin coating) | FTO/TiO2/CdS/CdSe/ZnS | 1 M sulfur and 1 M Na2S in H2O | 18.4 | 0.52 | 0.48 | 4.40 | Radich, J. G. [22] |
FTO/CuS (potentiodynamic electrodeposition) | FTO/TiO2/CdS-ZnS/CdSe/ZnS | 1 M sulfur and 1 M Na2S in H2O | 13.9 | 0.55 | 0.35 | 2.70 | Balis, N. [58] |
FTO/CoS (potentiodynamic electrodeposition) | FTO/TiO2/CdS-ZnS/CdSe/ZnS | 1 M sulfur and 1 M Na2S in H2O | 11.2 | 0.52 | 0.32 | 1.90 | Balis, N. [58] |
FTO/TiO2/CuS/CoS (Chemical bath deposition) | FTO/TiO2/CdS/CdSe/ZnS | 0.5 M sulfur, 2.0 M Na2S, and 0.2 M KCl in the solution of MeOH/H2O (7:3, v/v) | 17.11 | N/A | 0.554 | 4.10 | Yang, Z. [25] |
FTO/NiS (Chemical bath deposition) | FTO/TiO2/CdS/CdSe/ZnS | 2 M sulfur, 1 M Na2S, and 0.2 M KCl in the solution of MeOH/H2O (7:3, v/v) | 10.38 | 0.508 | 0.55 | 2.97 | Kim, H.-J. [20] |
FTO/MoOx/MoS2 (Electrophoretic Deposition) | FTO/TiO2/CdS/CdSe/ZnS | 5.00 mM sulfur, 20.0 mM Na2S and 0.100 M KCl in the solution of of MeOH/H2O (3/7, v/v) | 11.1 | 0.48 | 0.38 | 2.01 | This work |
Pt | FTO/TiO2/CdS/CdSe/ZnS | 5.00 mM sulfur, 20.0 mM Na2S and 0.100 M KCl in the solution of of MeOH/H2O (3/7, v/v) | 6.41 | 0.42 | 0.36 | 0.984 | This work |
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