Review Article

Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

Table 3

The damaged layer thickness measured by resist removal using wet ozone, SEM images, and resist removal using chemicals.

SampleResist removal (wet ozone) damaged layerSEM observation damaged layerResist removal (chemicals) damaged layer

10 keV (B ions)40 nm110 nm90 nm
70 keV (B ions)200 nm500 nm407 nm
150 keV (B ions)830 nm660 nm

10 keV (P ions)30 nm40 nm
70 keV (P ions)330 nm140 nm
150 keV (P ions)500 nm400 nm