Research Article
Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
Figure 3
AFM topography images of PS-b-PFS thin films on Si substrates prepared from 1.0 wt.% solution of the polymer in toluene after exposure to a THF for (a) 15 min, (b) 30 min, (c) 45 min, and (d) 1 h at room temperature.
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