Modeling and Simulation of  a Chemical  Vapor Deposition

<table class="table-group" id="tab3"><tr><td><table class="table"><tr><td class="thead-hr" colspan="3"><hr/></td></tr><tr class="thead"><td align="left"> Temperature (C)</td><td align="center"> Power (W)</td><td align="center"> Ratio (SiC : C)</td></tr><tr><td class="thead-hr" colspan="3"><hr/></td></tr><tr><td align="left"> 400</td><td align="center"> 900</td><td align="center"> 1 : 0.97</td></tr><tr><td align="left"> 400</td><td align="center"> 500</td><td align="center"> 1.3 : 1</td></tr><tr><td align="left"> 800</td><td align="center"> 900</td><td align="center"> 1.18 : 1</td></tr><tr class="table-tr"><td colspan="3"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

Journal of Applied Mathematics

tab3

Table 3

Table 3: Modeling and Simulation of  a Chemical  Vapor Deposition 