Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach

Figure 4

High resolution mass spectra (MS) and product ion (MS²) spectra of (a) compound detected as protonated mass at m/z 118.0865 Da (mass accuracy 2.2 ppm) corresponding to RRT 0.27 in the LC/UV platform with MS² at m/z 88.10 and 100.11. This proposed compound could correspond to the hydrolysis of the NMP to N-methyl-4-aminobutanoic (NM4ABA) in residual water contained in NMP. (b) NMP showing parent protonated mass at m/z 100.0759 (mass accuracy of 1.02 ppm) and MS² at m/z 58.07. (c) N-Methylsuccinimide (NMS) corresponding to RRT 0.63 at m/z 114.0552 Da with a mass accuracy of 2.1 ppm and main daughter ion at m/z 86.06 Da. (d) Main degradation product at RRT 0.92 (LC/UV) showed a protonated parent mass at m/z at 116.0708 Da and a product ion at m/z 73.11 proposed as 5-hydroxy-N-methylpyrrolidone (5-HNMP) with a mass accuracy of 1.5 ppm.

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