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E-Journal of Chemistry
Volume 9 (2012), Issue 4, Pages 1992-1999
http://dx.doi.org/10.1155/2012/473683

Effect of Annealing on the Nanostructure Formation in Alkoxy Substituted Phthalocyanine Thin Films

Thin Film Lab, School of Pure and Applied Physics, Mahatma Gandhi University, Kottayam-686 560, India

Received 22 October 2011; Accepted 30 December 2011

Copyright © 2012 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Vacuum deposited 2,3,9,10,16,17,23,24-octakis (octyloxy) phthalocyanine (H2PcOC8) thin films on glass substrates have exhibited a change on their surface morphology with the post deposition annealing temperature under normal atmosphere. These films have been characterized by optical absorptions and Scanning Electron Microscopy. SEM images also have shown nano-rod like structures for the samples annealed at different temperatures. The variation of optical band gap with annealing temperature is determined. The direct and allowed optical band gap energy has been evaluated from the α2 versus hυ plots. The electrical conductivity of the films at various heat treated samples are also studied. The activation energies are determined from the Arrhenius plots of lnσ versus 1000/T . It shows variation with the annealing temperature.