Table of Contents Author Guidelines Submit a Manuscript
Journal of Nanomaterials
Volume 2006 (2006), Article ID 58237, 6 pages

Growth of Boron-Rich Nanowires by Chemical Vapor Deposition (CVD)

1Department of Chemical and Materials Engineering, University of Cincinnati, Cincinnati, OH 45221-0012, USA
2Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO 80401, USA

Received 9 March 2006; Revised 13 July 2006; Accepted 31 July 2006

Academic Editor: E. G. Wang

Copyright © 2006 L. Guo et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

L. Guo, R. N. Singh, and H. J. Kleebe, “Growth of Boron-Rich Nanowires by Chemical Vapor Deposition (CVD),” Journal of Nanomaterials, vol. 2006, Article ID 58237, 6 pages, 2006. doi:10.1155/JNM/2006/58237