Journal of Nanomaterials / 2009 / Article / Fig 8

Research Article

Origin of the Difference in the Resistivity of As-Grown Focused-Ion- and Focused-Electron-Beam-Induced Pt Nanodeposits

Figure 8

HRTEM images of a Pt nanodeposit by (a) FIBID and (b) FEBID, in both cases grown at 30 kV beam energy on top of a TEM Cu grid covered with a thin supporting holey carbon membrane. One Pt grain has been selected in each case for magnification and clear observation of the corresponding atomic planes. The Fast-Fourier-Transform of the full image gives diffraction spots that correspond to the (200), (111), (222), and (202) atomic planes of fcc Pt.
936863.fig.008a
(a) FIBID Pt deposit
936863.fig.008b
(b) FEBID Pt deposit

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