Journal of Nanomaterials / 2009 / Article / Fig 8

Research Article

Origin of the Difference in the Resistivity of As-Grown Focused-Ion- and Focused-Electron-Beam-Induced Pt Nanodeposits

Figure 8

HRTEM images of a Pt nanodeposit by (a) FIBID and (b) FEBID, in both cases grown at 30 kV beam energy on top of a TEM Cu grid covered with a thin supporting holey carbon membrane. One Pt grain has been selected in each case for magnification and clear observation of the corresponding atomic planes. The Fast-Fourier-Transform of the full image gives diffraction spots that correspond to the (200), (111), (222), and (202) atomic planes of fcc Pt.
(a) FIBID Pt deposit
(b) FEBID Pt deposit

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