Origin of the Difference in the Resistivity of As-Grown Focused-Ion- and Focused-Electron-Beam-Induced Pt Nanodeposits

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="936863.fig.009a" src="https://static.hindawi.com/articles/jnm/volume-2009/936863/figures/936863.fig.009a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>FEBID</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="936863.fig.009b" src="https://static.hindawi.com/articles/jnm/volume-2009/936863/figures/936863.fig.009b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>FIBID</td></tr></table></td></tr></table>

<table>Average Pt atomic content (measured by EDX) versus the incident beam energy used for the growth in the investigated (a) FEBID deposits and (b) FIBID deposits. In this last case the Ga content is also shown. An incident electron beam energy of 10 kV was always used for the EDX experiments.</table>

Journal of Nanomaterials

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Figure 9

Figure 9: Origin of the Difference in the Resistivity of As-Grown Focused-Ion- and Focused-Electron-Beam-Induced Pt Nanodeposits 