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Journal of Nanomaterials
Volume 2010 (2010), Article ID 148596, 4 pages
Research Article

The Field Emission Properties of Graphene Aggregates Films Deposited on Fe-Cr-Ni alloy Substrates

1School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China
2Materials Physics Laboratory of Education Ministry of China, Zhengzhou University, Zhengzhou 450052, China
3Department of Engineering Mechanics, Zhengzhou University, Zhengzhou 450001, China

Received 31 May 2010; Accepted 21 June 2010

Academic Editor: Rakesh Joshi

Copyright © 2010 Zhanling Lu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The graphene aggregates films were fabricated directly on Fe-Cr-Ni alloy substrates by microwave plasma chemical vapor deposition system (MPCVD). The source gas was a mixture of H 2 and C H 4 with flow rates of 100 sccm and 12 sccm, respectively. The micro- and nanostructures of the samples were characterized by Raman scattering spectroscopy, field emission scanning electron microscopy (SEM), and transparent electron microscopy (TEM). The field emission properties of the films were measured using a diode structure in a vacuum chamber. The turn-on field was about 1.0 V/ 𝜇 m. The current density of 2.1 mA/ c m 2 at electric field of 2.4 V/ 𝜇 m was obtained.