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Journal of Nanomaterials
Volume 2010 (2010), Article ID 365614, 8 pages
Research Article

Effect of Nano-Ni Catalyst on the Growth and Characterization of Diamond Films by HFCVD

1Department of Chemistry and Biochemistry, Northern Illinois University, Dekalb, IL 60115, USA
2Chemical Vapor Deposition Division, Research and Development Department, Kinik Company, No. 64, Chung-San Road, Ying-Ko, Taipei 239, Taiwan
3Department of Chemistry, Tamkung University, Tamsui, Taipei 239, Taiwan
4Department o f Mechanical Engineering, Northern Illinois University, Dekalb, IL 60115, USA

Received 23 July 2009; Accepted 4 March 2010

Academic Editor: Rakesh Joshi

Copyright © 2010 Chien-Chung Teng et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Four different catalysts, nanodiamond seed, nano-Ni, diamond powder, and mixture of nano-Ni/diamond powder, were used to activate Si wafers for diamond film growth by hot-filament CVD (HFCVD). Diamond crystals were shown to grow directly on both large diamond powder and small nanodiamond seed, but a better crystallinity of diamond film was observed on the ultrasonicated nanodiamond seeded Si substrate. On the other hand, nano-Ni nanocatalysts seem to promote the formation of amorphous carbon but suppress transpolyacetylene (t-PA) phases at the initial growth of diamond films. The subsequent nucleation and growth of diamond crystals on the amorphous carbon layer leads to generation of the spherical diamond particles and clusters prior to coalescence into continuous diamond films based on the CH3 addition mechanism as characterized by XRD, Raman, ATR/FT-IR, XPS, TEM, SEM, and AFM techniques. Moreover, a 36% reduction in surface roughness of diamond film assisted by nano-Ni catalyst is quite significant.