Fabrication and Characterization of Hydrophilic TiO₂ Thin Films on Unheated Substrates Prepared by Pulsed DC Reactive Magnetron Sputtering

Figure 1

XRD patterns of TiO₂ thin films deposited on Si substrates at (a) two different operating pressures of 10 mTorr (sample A) and 3 mTorr (sample C), and (b) different deposition times of 30, 60, 90, and, 120 min (samples B, C, D, and E, resp.).

(a)

(b)