Fabrication and Characterization of Hydrophilic TiO₂ Thin Films on Unheated Substrates Prepared by Pulsed DC Reactive Magnetron Sputtering

Table 1

Deposition conditions of TiO₂ thin films.

Sample	Operating pressure; (mTorr)	Deposition time; (min)	Thickness (nm)		Surface; roughness (nm)
			FE-SEM	SE	SE
A	10	90	95	89	2.8
B	3	30	45	41	—
C	3	60	79	85	3.2
D	3	90	120	123	4.7
E	3	120	153	151	5.2