Angular Distribution of Damping Coefficient of Ablated Particle in Pure He, Ne, and Ar Gases
Figure 3
SEM images of the Si films deposited by pulsed laser deposition in 10 Pa He environment gas, where (a), (b), (c),(d), (e), (f), and (g) correspond to various angles of fixed Si wafers: −80°,−60°, −30°, 0°, 30°, 60°, and 80°, respectively.
