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Journal of Nanomaterials
Volume 2011, Article ID 579427, 7 pages
http://dx.doi.org/10.1155/2011/579427
Research Article

Characterizations of InN Thin Films Grown on Si (110) Substrate by Reactive Sputtering

Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, 11800 Penang, Malaysia

Received 19 February 2011; Revised 18 April 2011; Accepted 21 May 2011

Academic Editor: Gong Ru Lin

Copyright © 2011 M. Amirhoseiny et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

M. Amirhoseiny, Z. Hassan, S. S. Ng, and M. A. Ahmad, “Characterizations of InN Thin Films Grown on Si (110) Substrate by Reactive Sputtering,” Journal of Nanomaterials, vol. 2011, Article ID 579427, 7 pages, 2011. https://doi.org/10.1155/2011/579427.