Journal of Nanomaterials
Volume 2012, Article ID 127646, 4 pages
http://dx.doi.org/10.1155/2012/127646
Amorphous Hafnium-Indium-Zinc Oxide Semiconductor Thin Film Transistors
Institute of Microelectronics and Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101, Taiwan
Received 14 March 2012; Revised 17 June 2012; Accepted 18 June 2012
Academic Editor: Gong Ru Lin
Copyright © 2012 Sheng-Po Chang and San-Syong Shih. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
How to Cite this Article
Sheng-Po Chang and San-Syong Shih, “Amorphous Hafnium-Indium-Zinc Oxide Semiconductor Thin Film Transistors,” Journal of Nanomaterials, vol. 2012, Article ID 127646, 4 pages, 2012. https://doi.org/10.1155/2012/127646.