Research Article

A Novel Method to Grow Vertically Aligned Silicon Nanowires on Si (111) and Their Optical Absorption

Figure 4

Plan-view SEM images of the SiNWs grown with various SiCl4 feeding temperatures: (a) 850°C, (b) 800°C, (c) 700°C, and (d) 600°C employing the direct heating procedures without H2 annealing.
274618.fig.004a
(a)
274618.fig.004b
(b)
274618.fig.004c
(c)
274618.fig.004d
(d)