Journal of Nanomaterials / 2012 / Article / Fig 1

Research Article

Patterning Luminescent Nanocrystalline L a P O 4  : Eu and C e P O 4  : Tb Particles Embedded in Hybrid Organosilica with Soft-Lithographic Techniques

Figure 1

SEM and AFM images of LaPO4 : Eu NPs embedded in hybrid organosilica and made with the MIMIC technique. (a) SEM image of line patterns having 𝑤 𝑙 = 6 μm and 𝑠 𝑙 = 1 2 μm; (b) SEM image of a nonannealed line pattern showing patterned lines and PDMS residue having 𝑤 𝑙 = 1 . 5 μm and 𝑠 𝑙 = 1 . 5 μm; (c) Cross-sectional SEM image of 1.5 μm patterned lines; (d) AFM image of 1.5 μm wide lines showing surface roughness due to residual PDMS layer; (e) SEM image of pit-patterned film having 𝑃 𝑑 = 8 0 0  nm, depicting the detachment of the pattern due to strong adhesion of the film to the mould; (f) pit pattern showing white PDMS residues inside the pit pattern. Here 𝑤 𝑙 , 𝑠 𝑙 , and 𝑃 𝑑 mean the width of the lines, spacing between the lines, and diameter of the pit, respectively.
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