Patterning Luminescent Nanocrystalline LaPO₄ : Eu and CePO₄ : Tb Particles Embedded in Hybrid Organosilica with Soft-Lithographic Techniques

Figure 1

SEM and AFM images of LaPO₄ : Eu NPs embedded in hybrid organosilica and made with the MIMIC technique. (a) SEM image of line patterns having 𝑤_𝑙=6 μm and 𝑠_𝑙=12 μm; (b) SEM image of a nonannealed line pattern showing patterned lines and PDMS residue having 𝑤_𝑙=1.5 μm and 𝑠_𝑙=1.5 μm; (c) Cross-sectional SEM image of 1.5 μm patterned lines; (d) AFM image of 1.5 μm wide lines showing surface roughness due to residual PDMS layer; (e) SEM image of pit-patterned film having 𝑃_𝑑=800 nm, depicting the detachment of the pattern due to strong adhesion of the film to the mould; (f) pit pattern showing white PDMS residues inside the pit pattern. Here 𝑤_𝑙, 𝑠_𝑙, and 𝑃_𝑑 mean the width of the lines, spacing between the lines, and diameter of the pit, respectively.

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