Patterning Luminescent Nanocrystalline LaPO₄ : Eu and CePO₄ : Tb Particles Embedded in Hybrid Organosilica with Soft-Lithographic Techniques

Figure 7

(a) and (b) Photoluminescence micrographs of LaPO₄ : Eu line patterns with 𝑤_𝑙=4 μm, excited with 260 nm UV light, showing reduced luminescence intensity; (c) optical micrograph of a CePO₄ : Tb patterned film with 𝑤_𝑙=6 μm, depicting residues and color contrast due to thickness variations of a few nanometers.

(a)

(b)

(c)