Degradation of Semiconductor Manufacturing Wastewater by Using a Novel Magnetic Composite TiO<sub>2</sub>/Fe<sub>3</sub>O<sub>4</sub> Photoreactor Design

<table>Comparison of the effect of TiO<sub>2</sub>/Fe<sub>3</sub>O<sub>4</sub> catalyst on the DRE of IPA under the UV-A and VFL irradiation.</table>

Journal of Nanomaterials

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Figure 8

Figure 8: Degradation of Semiconductor Manufacturing Wastewater by Using a Novel Magnetic Composite TiO<sub>2</sub>/Fe<sub>3</sub>O<sub>4</sub> Photoreactor Design 

Journal of Nanomaterials

Degradation of Semiconductor Manufacturing Wastewater by Using a Novel Magnetic Composite TiO2/Fe3O4 Photoreactor Design

Figure 8

Degradation of Semiconductor Manufacturing Wastewater by Using a Novel Magnetic Composite TiO₂/Fe₃O₄ Photoreactor Design