Research Article

The Effect of Mg Dopant and Oxygen Partial Pressure on Microstructure and Phase Transformation of Z n T i O 𝟑 Thin Films

Figure 7

AFM surface morphologies and the right pictures depict typical three-dimensional representations (1000 nm × 1000 nm surface plots) of the zinc titanate thin films deposited at 400°C of substrate temperature and then annealed at 800°C: (a) and (b) Ar to O2 ratio 10 : 0, and (c) and (d) Ar to O2 9 : 1.
539657.fig.007a
(a)
539657.fig.007b
(b)
539657.fig.007c
(c)
539657.fig.007d
(d)