Thermal Stability of Neodymium Aluminates High-<i>κ</i> Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors

<table>(a) X-ray diffraction traces for NdAlO<i><sub>x</sub></i>/SiO<sub>2  </sub>stacks as a function of RTA temperatures. (b) A comparison of MEIS data of a NdAlO<i><sub>x</sub></i>/SiO<sub>2  </sub>stack prior to and after RTA in pure N<sub>2  </sub>ambient for 1 min.</table>

Journal of Nanomaterials

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Figure 1

Figure 1: Thermal Stability of Neodymium Aluminates High-<i>κ</i> Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors 

Figure 1 | Thermal Stability of Neodymium Aluminates High-κ Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors 