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Journal of Nanomaterials
Volume 2013, Article ID 154179, 7 pages
Research Article

Nanoindentation and Adhesion Properties of Ta Thin Films

Department of Materials Science and Engineering, I-Shou University, Kaohsiung 840, Taiwan

Received 1 February 2013; Revised 6 March 2013; Accepted 14 March 2013

Academic Editor: Ugur Serincan

Copyright © 2013 Yuan-Tsung Chen. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Citations to this Article [4 citations]

The following is the list of published articles that have cited the current article.

  • A Roshanghias, G Khatibi, R Pelzer, J Steinbrenner, and J Bernardi, “Cross-sectional nanoindentation (CSN) studies on the effect of thickness on adhesion strength of thin films,” Journal of Physics D: Applied Physics, vol. 48, no. 3, pp. 035301, 2014. View at Publisher · View at Google Scholar
  • A. Roshanghias, G. Khatibi, R. Pelzer, and J. Steinbrenner, “On the effects of thickness on adhesion of TiW diffusion barrier coatings in silicon integrated circuits,” Surface & Coatings Technology, vol. 259, pp. 386–392, 2014. View at Publisher · View at Google Scholar
  • Roshangias, Pelzer, Khatibi, and Steinbrenner, “Thickness dependency of adhesion properties of TiW thin films,” Proceedings of the 16th Electronics Packaging Technology Conference, EPTC 2014, pp. 192–195, 2014. View at Publisher · View at Google Scholar
  • Pengwei Zhou, Wei Li, Yu Li, and Xuejun Jin, “ The Effect of MoS 2 Content on the Protective Performance of Ni-MoS 2 Composite Coatings against Hydrogen Embrittlement in High Strength Steel ,” Journal of The Electrochemical Society, vol. 164, no. 2, pp. D23–D29, 2016. View at Publisher · View at Google Scholar