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Journal of Nanomaterials
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Journal of Nanomaterials
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2013
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Article
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Fig 1
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Research Article
Nanoindentation and Adhesion Properties of Ta Thin Films
Figure 1
XRD results for Ta films at three conditions. (a) Deposited at RT only, (b) postannealing at
= 150°C for 1 h, and (c) postannealing at
= 250°C for 1 h.
(a)
(b)
(c)