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Journal of Nanomaterials
Volume 2013 (2013), Article ID 252965, 6 pages
Research Article

Low-Temperature Annealing Induced Amorphization in Nanocrystalline NiW Alloy Films

1State-Key Laboratory for Mechanical Behavior of Material, Xi’an Jiaotong University, Xi’an 710049, China
2State-Key Laboratory for Strength and Vibration of Mechanical Structures, School of Aerospace, Xi’an Jiaotong University, Xi’an 710049, China

Received 23 May 2013; Accepted 20 July 2013

Academic Editor: Fathallah Karimzadeh

Copyright © 2013 Z. Q. Chen et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Annealing induced amorphization in sputtered glass-forming thin films was generally observed in the supercooled liquid region. Based on X-ray diffraction and transmission electron microscope (TEM) analysis, however, here, we demonstrate that nearly full amorphization could occur in nanocrystalline (NC) sputtered NiW alloy films annealed at relatively low temperature. Whilst the supersaturation of W content caused by the formation of Ni4W phase played a crucial role in the amorphization process of NiW alloy films annealed at 473 K for 30 min, nearly full amorphization occurred upon further annealing of the film for 60 min. The redistribution of free volume from amorphous regions into crystalline regions was proposed as the possible mechanism underlying the nearly full amorphization observed in NiW alloys.