One-Step Fabrication of Hierarchically Structured Silicon Surfaces and Modification of Their Morphologies Using Sacrificial Layers
Figure 3
Optical images of nanostructured surfaces at various DRIE processing times: (a) 3000 s, (c) 4000 s, and (e) 5000 s. (b), (d), and (f) are SEM images and magnified images of (a), (c), and (e), respectively.
