Research Article

Sub-15 nm Silicon Lines Fabrication via PS-b-PDMS Block Copolymer Lithography

Figure 4

SEM images of silicon nanostructures. (a) Silicon nanowires after 15 s silicon etch. (b) Silicon nanostructures after 20 s silicon etch. (c) No pattern transfer in bilayer and multilayer regions. (d) Complete pattern transfer in monolayer regions of PS-b-PDMS template. Inset (d) shows the high resolution image of nanowires.
831274.fig.004a
(a)
831274.fig.004b
(b)
831274.fig.004c
(c)
831274.fig.004d
(d)