Annealing Effects of Sputtered Cu₂O Nanocolumns on ZnO-Coated Glass Substrate for Solar Cell Applications

Table 1

Sputtering parameters for Cu₂O films.

RF power of Cu target	50 W
Working pressure	4.3 × 10^−3 Torr
Annealing temperatures	300–500°C
Flow rate of argon	50 sccm
Flow rate of oxygen	1–3 sccm
Film thickness	800–1000 nm