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Journal of Nanomaterials
Volume 2014 (2014), Article ID 126053, 7 pages
Research Article

The Influence of Electrophoretic Deposition for Fabricating Dye-Sensitized Solar Cell

1Department of Electronic Engineering, National Yunlin University of Science and Technology, Douliou, Yunlin 64002, Taiwan
2Department of Electronic Engineering and Graduate School of Electronic Engineering, National Yunlin University of Science and Technology, Douliou, Yunlin, Taiwan
3Department of Information Management, TransWorld University, Yunlin 64063, Taiwan

Received 9 May 2014; Revised 18 August 2014; Accepted 18 August 2014; Published 28 August 2014

Academic Editor: Teen-Hang Meen

Copyright © 2014 Jung-Chuan Chou et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Titanium dioxide (TiO2) film was deposited on fluorine-doped tin oxide (FTO) glass substrate by electrophoretic deposition method (EPD). TiO2 films were prepared with different I2 dosages, electric field intensities and deposition time (D.T.), electrophotic deposition times. By different I2 dosages, electric field intensities, deposition time, electrophotic deposition times fabricated TiO2 films and compared photoelectric characteristics of TiO2 films to find optimal parameters which were the highest photovoltaic conversion efficiency. And use electrochemical impedance spectroscopy (EIS) to measure the Nyquist plots under different conditions and analyze the impendence of dye-sensitized solar cells at the internal heterojunction. According to the experimental results, the I2 dosage was 0.025 g which obtained the optimal characteristic parameters. Thickness of TiO2 film was 10.6 μm, the open-circuit voltage () was 0.77 V, the short-circuit current density () was 7.20 mA/cm2, the fill factor (F.F.) was 53.41%, and photovoltaic conversion efficiency (η) was 2.96%.