Microstructure Changes of Ti-Al-C Films Deposited by Filtered Cathodic Vacuum Arc

Table 2

Chemical composition: Ti/Al, Al/(Ti + Al), and C/(Ti + Al) atomic concentration ratios of deposited Ti-Al-C films.

	Elemental composition (at.%)			Ti/Al	Al/(Ti + Al)	C/(Ti + Al)
	Ti	Al	C
30 sccm	25.32	15.89	58.79	1.59	0.39	1.43
40 sccm	21.95	19.29	58.75	1.14	0.47	1.42
50 sccm	14.16	17.04	68.80	0.83	0.41	2.21
60 sccm	14.86	15.83	69.31	0.94	0.52	2.26
70 sccm	13.01	15.93	71.07	0.82	0.55	2.46
80 sccm	11.92	17.81	70.26	0.67	0.58	2.36