Research Article

Microspheres for the Growth of Silicon Nanowires via Vapor-Liquid-Solid Mechanism

Figure 1

FESEM images of the polished Si (100) surface covered by 10 nm of Au, after the CVD process (900°C, H2 and Ar atmosphere), showing the cracks (a) and paths (b) formed.
362798.fig.001a
(a)
362798.fig.001b
(b)