Simple, Fast, and Cost-Effective Fabrication of Wafer-Scale Nanohole Arrays on Silicon for Antireflection

Figure 1

Schematic of nanohole array fabrication procedures: (a) PS monolayer colloidal crystal prepared by spin-coating; (b) PS beads size reduction by oxygen etching; (c) Si-hole preparation by lifting off the etched PS bead from the Cr-layer; (d) Si-hole array fabrication by silicon dry etching.