Research Article

Agglomeration and Dendritic Growth of Cu/Ti/Si Thin Film

Figure 4

AFM topographic images of 90 nmCu/20 nmTi/Si thin film after annealing at various temperatures: (a) 500°C, (b) 600°C, (c) 700°C, and (d) 800°C.
518520.fig.004a
(a)
518520.fig.004b
(b)
518520.fig.004c
(c)
518520.fig.004d
(d)