Research Article
Design and Fabrication of Nanoscale IDTs Using Electron Beam Technology for High-Frequency SAW Devices
Table 2
Deposition parameters of Al thin films.
| | Target | Al (99.995%) | | Substrate-to-target distance (mm) | 50 | | Base pressure (Torr) | | | Substrate temperature (°C) | R. T. | | DC power (W) | 100 | | Sputtering pressure (mTorr) | 4 | | Ar (sccm) | 10 |
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