Design and Fabrication of Nanoscale IDTs Using Electron Beam Technology for High-Frequency SAW Devices

Table 4

The different line widths of IDTs fabricated with various e-beam exposure durations.

Line widths of IDT (nm)	Exposure duration (𝜇s)
937	2.2~1.7
750	2.2~1.85
562	2.3~2.2
375	2.6~2.5