Table of Contents Author Guidelines Submit a Manuscript
Journal of Nanomaterials
Volume 2014 (2014), Article ID 690498, 6 pages
http://dx.doi.org/10.1155/2014/690498
Research Article

Thermal Effect on the Structural, Electrical, and Optical Properties of In-Line Sputtered Aluminum Doped Zinc Oxide Films Explored with Thermal Desorption Spectroscopy

Department of Electrical Engineering, Kun Shan University, Tainan 71003, Taiwan

Received 7 May 2014; Accepted 18 May 2014; Published 29 May 2014

Academic Editor: Teen-Hang Meen

Copyright © 2014 Shang-Chou Chang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. R. Triboulet and J. Perrière, “Epitaxial growth of ZnO films,” Progress in Crystal Growth and Characterization of Materials, vol. 47, no. 2-3, pp. 65–138, 2003. View at Publisher · View at Google Scholar · View at Scopus
  2. R. G. Gordon, “Criteria for choosing transparent conductors,” MRS Bulletin, vol. 25, no. 8, pp. 52–57, 2000. View at Google Scholar · View at Scopus
  3. P. Nunes, E. Fortunato, P. Tonello, F. Braz Fernandes, P. Vilarinho, and R. Martins, “Effect of different dopant elements on the properties of ZnO thin films,” Vacuum, vol. 64, no. 3-4, pp. 281–285, 2002. View at Publisher · View at Google Scholar · View at Scopus
  4. R. J. Hong, X. Jiang, B. Szyszka, V. Sittinger, and A. Pflug, “Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering,” Applied Surface Science, vol. 207, no. 1–4, pp. 341–350, 2003. View at Publisher · View at Google Scholar · View at Scopus
  5. S. Suzuki, “Internal stress and adhesion of thin films sputtered onto glass by an in-line sputtering system,” Thin Solid Films, vol. 351, no. 1-2, pp. 194–197, 1999. View at Google Scholar · View at Scopus
  6. J. Cárabe and J. J. Gandia, “Thin-film-silicon solar cells,” Opto-electronics Review, vol. 12, no. 1, pp. 1–6, 2004. View at Google Scholar · View at Scopus
  7. F.-J. Haug, Z. Geller, H. Zogg, A. N. Tiwari, and C. Vignali, “Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering,” Journal of Vacuum Science and Technology A, vol. 19, no. 1, pp. 171–174, 2001. View at Publisher · View at Google Scholar · View at Scopus
  8. D. A. King, “Thermal desorption from metal surfaces: a review,” Surface Science, vol. 47, no. 1, pp. 384–402, 1975. View at Google Scholar · View at Scopus
  9. B. Hokkanen, S. Funk, U. Burghaus, A. Ghicov, and P. Schmuki, “Adsorption kinetics of alkanes on TiO2 nanotubesarray—structure-activity relationship,” Surface Science, vol. 601, no. 19, pp. 4620–4628, 2007. View at Publisher · View at Google Scholar · View at Scopus
  10. K. Higuchia, K. Yamamotob, H. Kajiokaa et al., “Remarkable hydrogen storage properties in three-layered Pd/Mg/Pd thin films,” Journal of Alloys and Compounds, vol. 330–332, pp. 526–530, 2002. View at Publisher · View at Google Scholar
  11. N. Patel, A. Kale, P. Mosaner, R. Checchetto, A. Miotello, and G. Das, “Deuterium thermal desorption from Ni-rich deuterated Mg thin films,” Renewable Energy, vol. 33, no. 2, pp. 232–236, 2008. View at Publisher · View at Google Scholar · View at Scopus
  12. S. C. Chang, T. C. Lin, T. S. Li et al., “Fluorine thermal stability of ZnO:F films investigated by thermal desorption spectroscopy,” in Proceedings of the International Conference on Electronic Materials and Packaging (EMAP '08), pp. 25–28, Taipei, Taiwan, October 2008. View at Publisher · View at Google Scholar
  13. C. Guillén and J. Herrero, “Optical, electrical and structural characteristics of Al:ZnO thin films with various thicknesses deposited by DC sputtering at room temperature and annealed in air or vacuum,” Vacuum, vol. 84, no. 7, pp. 924–929, 2010. View at Publisher · View at Google Scholar · View at Scopus
  14. S. C. Chang, G. W. Jian, S. H. Huang, T. S. Li, and T. C. Lin, “Some special phenomena observed from in-line sputtered aluminum doped zinc oxide films,” in Proceedings of the 5th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT '10), pp. 1–4, Taipei, Taiwan, October 2010. View at Publisher · View at Google Scholar · View at Scopus
  15. Y. M. Hu, C. W. Lin, and J. C. A. Huang, “Dependences of the Al thickness and annealing temperature on the structural, optical and electrical properties in ZnO/Al multilayers,” Thin Solid Films, vol. 497, no. 1-2, pp. 130–134, 2006. View at Publisher · View at Google Scholar · View at Scopus
  16. J. F. Chang, H. L. Wang, and M. H. Hon, “Studying of transparent conductive ZnO:Al thin films by RF reactive magnetron sputtering,” Journal of Crystal Growth, vol. 211, no. 1, pp. 93–97, 2000. View at Publisher · View at Google Scholar · View at Scopus
  17. M. Chen, X. Wang, Y. H. Yu et al., “X-ray photoelectron spectroscopy and auger electron spectroscopy studies of Al-doped ZnO films,” Applied Surface Science, vol. 158, no. 1, pp. 134–140, 2000. View at Publisher · View at Google Scholar · View at Scopus
  18. E. Burstein, “Anomalous optical absorption limit in InSb,” Physical Review, vol. 93, no. 3, pp. 632–633, 1954. View at Publisher · View at Google Scholar · View at Scopus
  19. T. S. Moss, “The interpretation of the properties of indium antimonide,” Proceedings of the Physical Society B, vol. 67, no. 10, pp. 775–782, 1954. View at Publisher · View at Google Scholar · View at Scopus
  20. G. Fang, D. Li, and B. L. Yao, “Fabrication and vacuum annealing of transparent conductive AZO thin films prepared by DC magnetron sputtering,” Vacuum, vol. 68, no. 4, pp. 363–372, 2002. View at Publisher · View at Google Scholar · View at Scopus