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Journal of Nanomaterials
Volume 2014, Article ID 857614, 7 pages
http://dx.doi.org/10.1155/2014/857614
Research Article

Effects of Hydrogen on the Optical and Electrical Characteristics of the Sputter-Deposited Al2O3-Doped ZnO Thin Films

1Department of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan
2Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan
3Electronics and Optoelectronics Research Laboratories, Industrial Technology Research Institute, Hsinchu 310, Taiwan

Received 22 October 2013; Accepted 13 January 2014; Published 9 March 2014

Academic Editor: Hong Seok Lee

Copyright © 2014 Fang-Hsing Wang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Fang-Hsing Wang, Cheng-Fu Yang, Jian-Chiun Liou, and In-Ching Chen, “Effects of Hydrogen on the Optical and Electrical Characteristics of the Sputter-Deposited Al2O3-Doped ZnO Thin Films,” Journal of Nanomaterials, vol. 2014, Article ID 857614, 7 pages, 2014. https://doi.org/10.1155/2014/857614.