Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering

<table>Variation of the concentration of titanium, silicon, carbon, and oxygen as a function of the applied bias voltage.</table>

Journal of Nanomaterials

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Figure 1

Figure 1: Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 

Figure 1 | Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 