Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering

<table>Variation of H/E and H<sup>3</sup>/E<sup>2</sup> for the films prepared at different applied bias voltage.</table>

Journal of Nanomaterials

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Figure 8

Figure 8: Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 

Figure 8 | Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 