Substrate Temperature Effect on the Microstructure and Properties of (Si, Al)/a-C:H Films Prepared through Magnetron Sputtering Deposition

Table 3

Duration of reaching the lowest friction coefficient () of the films.

Substrate temperature/K	423	473	573	673	773
Lowest	0.01	0.03	0.06	0.035	0.04
Duration/second	1700	1300	190	166	30