Oxidation and Corrosion Behavior of Nanolaminated MAX-Phase Ti₂AlC Film Synthesized by High-Power Impulse Magnetron Sputtering and Annealing

Table 1

The parameters of the HiPIMS and the deposition conditions of the films.

Pulsing parameters	[kW]	[kW]	[A]	[V]	[A/cm^2]
26 Hz; 7.0% duty cycle	0.8	24.1	40.0	626.4	0.78
Base pressure				2 × 10^−5 torr
Working pressure				5 × 10^−3 torr
Substrate temperature				Room temperature
Negative bias voltage				−60 V
Substrate to target distance				12 cm
Deposition time				2 h

(i) and are the power of the peak and average target.
(ii) is the current of the average target in a pulse length.
(iii) is the voltage of the average target.
(iv) is the pulse current density of the peak target.