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Journal of Nanomaterials
Volume 2015, Article ID 240525, 5 pages
Research Article

Electrodeposition and Characterization of CuTe and Cu2Te Thin Films

1Shaanxi Provincial Key Laboratory of Electroanalytical Chemistry, Institute of Analytical Science, Northwest University, Xi’an, Shaanxi 710069, China
2Key Laboratory of Synthetic and Natural Functional Molecule Chemistry of Ministry of Education, College of Chemistry and Materials Science, Northwest University, Xi’an, Shaanxi 710127, China

Received 22 November 2014; Revised 25 December 2014; Accepted 25 December 2014

Academic Editor: Jiamin Wu

Copyright © 2015 Wenya He et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


An electrodeposition method for fabrication of CuTe and Cu2Te thin films is presented. The films’ growth is based on the epitaxial electrodeposition of Cu and Te alternately with different electrochemical parameter, respectively. The deposited thin films were characterized by X-ray diffraction (XRD), field emission scanning electronic microscopy (FE-SEM) with an energy dispersive X-ray (EDX) analyzer, and FTIR studies. The results suggest that the epitaxial electrodeposition is an ideal method for deposition of compound semiconductor films for photoelectric applications.