The Influence of Thermal Conditions on V₂O₅ Nanostructures Prepared by Sol-Gel Method

Figure 6

SEM images of the coatings annealed for 10 h at different temperatures. (a) 200°C, deposited on quartz glass, (b) 200°C, deposited on silicon, (c) 300°C, deposited on quartz glass, (d) 300°C, deposited on silicon, (e) 480°C, deposited on quartz glass, (f) 480°C, deposited on silicon, (g) 600°C, deposited on quartz glass, and (h) 600°C, deposited on silicon.